Poughkeepsie, NY, United States of America

Ronald L Smith

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ronald L Smith. Retrieved from https://idiyas.com/inventor/ronald-l-smith-0dssmrju

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: The Innovations of Ronald L. Smith

Introduction

Ronald L. Smith is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of semiconductor fabrication. His work has been recognized through his patent, which showcases his expertise and innovative thinking.

Latest Patents

Ronald L. Smith holds a patent for a "Method of measuring oxide thickness during semiconductor fabrication." This invention is crucial for improving the accuracy and efficiency of semiconductor manufacturing processes. His patent portfolio includes 1 patent that reflects his commitment to advancing technology.

Career Highlights

Smith is currently employed at International Business Machines Corporation, commonly known as IBM. His role at IBM allows him to work on cutting-edge technologies and contribute to the company's reputation as a leader in innovation. His experience in the industry has equipped him with the skills necessary to tackle complex engineering challenges.

Collaborations

Throughout his career, Ronald has collaborated with talented individuals such as Jonathan H. Griffith and Roger L. Verkuil. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

In summary, Ronald L. Smith is an accomplished inventor whose work in semiconductor fabrication has made a lasting impact on the industry. His patent and collaborations highlight his dedication to innovation and excellence in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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