This inventor holds 1 USPTO granted patent. Top assignee: Howtek, Inc.. Active years: 1994.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1994
Title: The Innovations of Ronald L. Searcy
Introduction
Ronald L. Searcy is an accomplished inventor based in Londonderry, NH (US). He is known for his innovative contributions to the field of rotary scanning technology. With a focus on manufacturing methods, Searcy has made significant strides in enhancing the efficiency and effectiveness of rotary scanners.
Latest Patents
Searcy holds a patent for a "Method of manufacturing a rotary scanning drum." This invention involves a drum for a rotary scanner that operates in both transmissive and reflective modes. The manufacturing process ensures high concentricity while maintaining cost-effectiveness. By utilizing an oversized drum blank mounted on a cylindrical mandrel, Searcy's method allows for precise turning on a lathe to achieve the required external radius. End caps containing mounting means are then secured to the drum, facilitating its integration into a rotary scanner.
Career Highlights
Throughout his career, Ronald L. Searcy has been associated with Howtek, Inc., a company known for its advancements in imaging technology. His work has contributed to the development of innovative solutions in the field, showcasing his expertise and commitment to excellence.
Collaborations
Searcy has collaborated with notable colleagues, including Calvin M. Winey and Mark W. Magee. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Ronald L. Searcy's contributions to the field of rotary scanning technology exemplify his innovative spirit and dedication to advancing manufacturing methods. His patent for the rotary scanning drum highlights his ability to combine efficiency with cost-effectiveness. Searcy's work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile