Location History:
- Poughkeepsie, NY (US) (2005 - 2006)
- North Borough, MA (US) (2012)
Company Filing History:
Years Active: 2005-2012
Title: The Innovative Contributions of Ronald L. Gordon
Introduction
Ronald L. Gordon is a prominent inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of lithography, particularly in the development of methods that enhance the performance and manufacturability of photolithographic processes. With a total of 5 patents to his name, Gordon's work has had a substantial impact on the industry.
Latest Patents
One of his latest patents is titled "Fast method to model photoresist images using focus blur and resist blur." This innovative method determines an image of a patterned object formed by a polychromatic lithographic projection system. It involves providing patterns for the object, a spectrum of the radiation source, and a lens impulse response. The method includes forming a polychromatic 4D bilinear vector kernel and determining the image of the patterned object through convolutions with dominant polychromatic 2D kernels.
Another notable patent is "Pliant SRAF for improved performance and manufacturability." This method increases the coverage of subresolution assist features (SRAFs) in a layout. It ranks possible SRAF placement and sizing rules based on a figure of merit and evaluates different SRAF solutions to improve lithographic performance while avoiding manufacturability issues.
Career Highlights
Ronald L. Gordon is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and contribute to advancements in lithography. His expertise in the field has positioned him as a key figure in the development of new technologies that enhance manufacturing processes.
Collaborations
Throughout his career, Gordon has collaborated with notable colleagues, including Alan Edward Rosenbluth and Lars W. Liebmann. These collaborations have further enriched his work and contributed to the success of various projects.
Conclusion
Ronald L. Gordon's innovative contributions to lithography and his ongoing work at IBM highlight his importance in the field of technology. His patents reflect a commitment to improving manufacturing processes and advancing the capabilities of photolithographic systems.
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