This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 2001-2004.
Company Filing History:
Years Active: 2001-2004
Title: The Innovations of Ronald J Line
Introduction
Ronald J Line is a notable inventor based in Essex Junction, VT (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving processes that enhance the efficiency and effectiveness of semiconductor devices.
Latest Patents
One of Ronald J Line's latest patents is the "Integrated cobalt silicide process for semiconductor devices." This invention provides a method and apparatus for forming a silicide on a semiconductor substrate. The process integrates the removal of an oxide from the surface of a semiconductor substrate and the deposition of a metal on the cleaned surface under constant vacuum. This innovative approach eliminates the exposure of the cleaned substrate to air between the oxide removal and metal deposition steps. The in-situ cleaning of the silicon substrate prior to cobalt deposition results in a cleaner surface, which enhances the formation of cobalt silicide when the cobalt layer is annealed.
Career Highlights
Ronald J Line has had a distinguished career, working at the International Business Machines Corporation (IBM). His expertise in semiconductor processes has positioned him as a key figure in the development of advanced technologies in this field.
Collaborations
Throughout his career, Ronald has collaborated with notable coworkers such as Marc Waine Cantell and Jerome Brett Lasky. These collaborations have contributed to the advancement of semiconductor technology and innovation.
Conclusion
In summary, Ronald J Line is a prominent inventor whose work in semiconductor technology has led to significant advancements. His innovative patents and collaborations continue to influence the industry positively.