Location History:
- Tokyo, JP (2004 - 2007)
- San Jose, CA (US) (2001 - 2008)
Company Filing History:
Years Active: 2001-2008
Title: Innovations by Ronald J Kuse
Introduction
Ronald J Kuse is a prominent inventor based in San Jose, CA. He has made significant contributions to the field of manufacturing and packaging technologies, particularly in the semiconductor industry. With a total of 7 patents to his name, Kuse has demonstrated a commitment to advancing technology through innovative solutions.
Latest Patents
One of Kuse's latest patents is focused on reduced particle contamination manufacturing and packaging for reticles. This patent discloses a method of transporting a reticle using a specialized reticle carrier equipped with an ionizer. Additionally, the reticle may be attached to a pellicle, which consists of a pellicle frame and a pellicle film stretched over it. The pellicle frame incorporates absorbent material to enhance its functionality. Another notable patent involves purging gas from a photolithography enclosure between a mask protective device and a patterned mask. This invention describes a method and apparatus for removing initial gas from a gas-filled enclosure and adding a purge gas with a different composition, utilizing various means such as pressure, diffusion, or vacuum.
Career Highlights
Kuse is currently employed at Intel Corporation, where he continues to innovate and contribute to the development of advanced technologies. His work at Intel has positioned him as a key player in the semiconductor manufacturing sector.
Collaborations
Throughout his career, Kuse has collaborated with notable colleagues, including Giang T Dao and Han-Ming Wu. These collaborations have further enriched his work and contributed to the success of various projects.
Conclusion
Ronald J Kuse's contributions to the field of semiconductor manufacturing and packaging are noteworthy. His innovative patents and ongoing work at Intel Corporation highlight his dedication to advancing technology. Kuse's achievements serve as an inspiration for future inventors in the industry.