Ronald J Gutmann

Title: The Innovations of Ronald J Gutmann

Introduction

Ronald J Gutmann is a notable inventor based in Troy, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in chemical mechanical planarization. With a total of 2 patents, his work has had a lasting impact on the industry.

Latest Patents

Gutmann's latest patents include innovative systems for performing chemical mechanical planarization. One of his patents describes a system that includes a chemical mechanical polishing system with a slurry, a device for measuring the electrochemical potential of the slurry, and a device for detecting the end point of the process based on this potential. This invention allows for accurate in situ control of the chemical mechanical polishing process. Another patent focuses on a control component for a three-electrode device, which features a gate biasing circuit that improves the low-frequency distortion characteristics of GaAs MESFET control components. This advancement enables better microwave power handling and maintains distortion characteristics below 100 Hz.

Career Highlights

Throughout his career, Gutmann has worked with esteemed organizations such as Rensselaer Polytechnic Institute and Mia-com, Inc. His experience in these institutions has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Gutmann has collaborated with notable professionals in his field, including Shyam P Murarka and David J Duquette. These collaborations have further enriched his work and contributed to advancements in semiconductor technology.

Conclusion

Ronald J Gutmann's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the industry and inspire future innovations.