Ronald F Klopp

Title: The Innovative Contributions of Ronald F Klopp

Introduction

Ronald F Klopp is a notable inventor based in Sinking Spring, PA (US). He has made significant contributions to the field of semiconductor processing through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of thermal processing reactors.

Latest Patents

Ronald F Klopp holds a patent for a "Method and apparatus for uniform direct radiant heating in a rapid thermal processing reactor." This invention addresses the challenge of achieving uniform temperature across the width and breadth of a semiconductor wafer. The method involves the placement of a dome-shaped thermal insert in close proximity to the wafer, allowing for optimal thermal energy absorption. The design ensures that the spacing between the thermal insert and the wafer is minimized for maximum efficiency, while also incorporating a guard ring to mitigate bottom-side reflective thermal energy exposure.

Career Highlights

Klopp's career is marked by his role at Primaxx, Inc., where he has applied his expertise in thermal processing technologies. His innovative approach has contributed to advancements in semiconductor manufacturing, making processes more efficient and reliable.

Collaborations

Throughout his career, Ronald has collaborated with talented individuals such as Robert W Grant and Benjamin J Petrone. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

In summary, Ronald F Klopp's contributions to the field of semiconductor processing through his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the industry and improve manufacturing processes.