Dronten, Netherlands

Ronald Ekkel

This inventor holds 1 USPTO granted patent. Top assignee: Wavin B.v.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ronald Ekkel. Retrieved from https://idiyas.com/inventor/ronald-ekkel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Ronald Ekkel

Introduction

Ronald Ekkel is a notable inventor based in Dronten, Netherlands. He has made significant contributions to the field of fluid connection technology. His innovative approach has led to the development of a unique press fitting device.

Latest Patents

Ronald Ekkel holds a patent for a press fitting device designed to establish a fluid-tight connection with at least one pipe section. This device is engineered to generate a sound when a gaseous fluid flows through it. The device operates in two conditions: a pre-press fit condition, where a connection is established before it is press-fit, and a press fit condition, where the connection is press-fit but may not be fluid-tight.

Career Highlights

Ekkel is associated with Wavin B.V., a company known for its innovative solutions in the field of plastic pipe systems. His work at Wavin B.V. has allowed him to focus on developing technologies that enhance fluid management systems.

Collaborations

Ronald collaborates with talented individuals such as Bastiaan Vos and Gerrit Jan Nijman. Their combined expertise contributes to the advancement of innovative solutions in their field.

Conclusion

Ronald Ekkel's contributions to the invention of the press fitting device exemplify his commitment to innovation in fluid connection technology. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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