Rock Hill, SC, United States of America

Ronald E Hostetler

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Basf Aktiengesellschaft. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ronald E Hostetler. Retrieved from https://idiyas.com/inventor/ronald-e-hostetler-xl2xa3l1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Ronald E. Hostetler

Introduction

Ronald E. Hostetler is a notable inventor based in Rock Hill, SC (US). He has made significant contributions to the field of paper coating technology. His innovative methods have paved the way for advancements in the industry.

Latest Patents

Hostetler holds a patent for a method of making a paper coating using a blend of a vinyl aromatic-acrylic polymer dispersion with a vinyl aromatic-diene polymer dispersion. This method involves providing a composition, applying it to a paper substrate, and forming a paper coating. The composition consists of a blend of polymers, where the vinyl aromatic-acrylic polymer is present in an amount from 50% to about 95%, and the vinyl aromatic-diene polymer is present in an amount from about 5% to 50%. He has 1 patent to his name.

Career Highlights

Throughout his career, Hostetler has worked with prominent companies such as BASF Aktiengesellschaft and BASF SE Corporation. His experience in these organizations has contributed to his expertise in polymer technology and paper coatings.

Collaborations

Some of his notable coworkers include Peter C. Hayes and David Abundis. Their collaboration has likely fostered an environment of innovation and creativity in their respective projects.

Conclusion

Ronald E. Hostetler's contributions to the field of paper coating technology demonstrate his innovative spirit and dedication to advancing industry standards. His work continues to influence the development of new materials and methods in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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