Company Filing History:
Years Active: 1987-1988
Title: Innovations by Ronald D Behee in Substrate Heating Technology
Introduction
Ronald D Behee is a notable inventor based in Tempe, AZ (US), recognized for his contributions to substrate heating technology. He holds 2 patents that focus on methods and apparatuses for heating substrates in epitaxial deposition reactors. His innovative approaches have significantly advanced the efficiency and uniformity of substrate heating processes.
Latest Patents
Behee's latest patents include a method and apparatus for substrate heating in an axially symmetric environment. This invention describes an apparatus designed for heating a substrate and its associated rotatable susceptor within an epitaxial deposition reactor. The system utilizes a chamber equipped with multiple heat lamps, which are strategically arranged to ensure symmetrical heating around the substrate axis. The design incorporates reflective coatings on the chamber walls to enhance the efficiency of the heat lamps. Additionally, the outermost lamps can be adjusted to produce higher temperatures, compensating for thermal losses in areas of the reactor that provide access to the substrate. The substrate's rotation on the susceptor further aids in achieving a uniform thermal environment.
Career Highlights
Throughout his career, Ronald D Behee has made significant strides in the field of substrate heating technology. His work at Epsilon Limited Partnership has allowed him to develop innovative solutions that address thermal non-uniformity in heating cavities. His inventions have been instrumental in improving the performance of epitaxial deposition reactors, making them more efficient and effective.
Collaborations
Behee has collaborated with notable professionals in his field, including McDonald Robinson and Wiebe B deBoer. These partnerships have contributed to the advancement of his research and the successful implementation of his patented technologies.
Conclusion
Ronald D Behee's contributions to substrate heating technology through his innovative patents have had a lasting impact on the industry. His work continues to influence the development of more efficient epitaxial deposition processes.