Ronald C McFarland

Title: The Innovations of Ronald C. McFarland

Introduction

Ronald C. McFarland is a notable inventor based in Mountain View, California. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of integrated circuits. His innovative approach has led to advancements that improve production efficiency and device performance.

Latest Patents

One of Ronald C. McFarland's key patents is titled "Use of titanium hydride in integrated circuit fabrication." This patent describes an improved process for forming titanium silicide layers on silicon regions of semiconductor devices that have native oxide. The method involves a reactively sputter deposited layer of TiH.sub.x.ltoreq.2, followed by a rapid thermal anneal in a nitrogen-bearing gas. This process effectively lowers silicidation activation energy and reduces anneal temperature requirements. As a result, production throughput is enhanced compared to previous methods that addressed the challenges posed by native oxide. Additionally, this process allows for the creation of a titanium nitride/titanium silicide bilayer on silicon, as well as a titanium nitride/titanium bilayer on silicon dioxide. The use of TiH.sub.x.ltoreq.2 instead of traditional Ti layers improves the thickness of the titanium nitride layer over silicon dioxide, thereby enhancing its utility as a diffusion barrier layer.

Career Highlights

Ronald C. McFarland has had a distinguished career at Varian Associates, Inc., where he has applied his expertise in semiconductor fabrication. His work has been instrumental in advancing the technology used in integrated circuits, making significant contributions to the industry.

Collaborations

Ronald has collaborated with various professionals in his field, including his coworker Michelangelo Delfino. Their combined efforts have led to innovative solutions and advancements in semiconductor technology.

Conclusion

Ronald C. McFarland's contributions to the field of semiconductor fabrication through his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the industry and improve the efficiency of integrated circuit production.