Gardner, NY, United States of America

Ron J McDonald


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: The Innovations of Ron J McDonald

Introduction

Ron J McDonald is an accomplished inventor based in Gardner, NY (US). He has made significant contributions to the field of materials science, particularly in the area of photoactive polymers. His innovative work has led to the development of a patented method that enhances the efficiency of pattern formation using laser technology.

Latest Patents

Ron J McDonald holds a patent for "Laser exposure of photosensitive polyimide for pattern formation." This method involves patterning a preimidized benzophenone photoactive polymer used as a photoresist with a laser light source. The technique improves crosslinking efficiency and reduces swelling, enabling the formation of lines on the order of microns. This advancement has important implications for various applications in microfabrication.

Career Highlights

Ron J McDonald is currently employed at International Business Machines Corporation (IBM). His role at IBM allows him to work on cutting-edge technologies and collaborate with other talented professionals in the field. His expertise in photoactive polymers and laser technology has positioned him as a valuable asset to the company.

Collaborations

Throughout his career, Ron has collaborated with notable colleagues, including Peter A Agostino and Ajay Prabhakar Giri. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Ron J McDonald is a prominent inventor whose work in laser technology and photoactive polymers has made a significant impact in the field. His patented method for pattern formation showcases his innovative spirit and dedication to advancing technology. His contributions continue to influence the industry and inspire future innovations.

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