Roman Orlik

Title: Innovations of Roman Orlik in Projection Lithography

Introduction

Roman Orlik is a notable inventor based in Katlenburg-Lindau, Germany. He has made significant contributions to the field of optical engineering, particularly in projection lithography. His innovative work has led to the development of a unique optical element that enhances imaging light guidance.

Latest Patents

Roman Orlik holds a patent for an optical element designed for the beam guidance of imaging light in projection lithography. This optical element features a main body and at least one optical surface. Additionally, it includes at least one compensation weight element attached to the main body, which serves to compensate for figure deformation of the optical surface caused by gravity. This design results in an optical element with minimal figure deformation at the use location, thereby improving the accuracy and efficiency of projection lithography processes. He has 1 patent to his name.

Career Highlights

Roman Orlik is currently employed at Carl Zeiss SMT GmbH, a leading company in optical systems and technologies. His work at this esteemed organization has allowed him to further develop his expertise in optical engineering and contribute to cutting-edge innovations in the field.

Collaborations

Throughout his career, Roman has collaborated with talented professionals, including Jens Prochnau and Dirk Schaffer. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in optical technology.

Conclusion

Roman Orlik's contributions to projection lithography through his innovative optical element demonstrate his commitment to advancing optical engineering. His work not only enhances the functionality of imaging systems but also sets a benchmark for future innovations in the field.