Vilters, Switzerland

Roman Meuli

This inventor holds 3 USPTO granted patents and 1 published patent application. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roman Meuli. Retrieved from https://idiyas.com/inventor/roman-meuli

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 11.0

ph-index = 1


Years Active: 2025

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3 patents (USPTO):Explore Patents

Title: The Innovations of Roman Meuli

Introduction

Roman Meuli is a notable inventor based in Vilters, Switzerland. He has made significant contributions to the field of measurement technology. With a total of 3 patents to his name, Meuli has established himself as a key figure in his area of expertise.

Latest Patents

Among his latest innovations are the Measuring Instrument Bridge and the Measuring Instrument Sensor. These patents reflect his commitment to enhancing measurement accuracy and efficiency in various applications. His work continues to push the boundaries of what is possible in measurement technology.

Career Highlights

Throughout his career, Roman Meuli has demonstrated a strong dedication to innovation. His inventions have not only advanced technology but have also provided practical solutions to real-world problems. His ability to conceptualize and develop new ideas has earned him recognition in the industry.

Collaborations

Meuli has collaborated with talented individuals such as Andreas Thomann and André Römer. These partnerships have allowed him to expand his creative horizons and bring his ideas to fruition. Working alongside skilled professionals has enriched his projects and contributed to their success.

Conclusion

Roman Meuli's contributions to measurement technology are noteworthy and impactful. His innovative spirit and collaborative efforts continue to inspire advancements in the field. The legacy of his inventions will undoubtedly influence future developments in measurement technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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