Company Filing History:
Years Active: 2018-2022
Title: Innovations of Roman Chalykh in Extreme Ultraviolet Lithography
Introduction
Roman Chalykh is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of extreme ultraviolet (EUV) lithography. With a total of 4 patents to his name, Chalykh's work is recognized for its innovative approaches and technical advancements.
Latest Patents
One of his latest patents involves a phase-shift mask for extreme ultraviolet lithography. This phase-shift mask includes a substrate, a reflection layer on the substrate, and phase-shift patterns that incorporate at least one metal nitride on the reflection layer. The metal nitrides may consist of materials such as TaN, TiN, ZrN, HfN, CrN, VN, NbN, MoN, WN, AlN, GaN, ScN, and YN. This invention aims to enhance the efficiency and precision of EUV lithography processes.
Career Highlights
Roman Chalykh is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology in his field. His work has been instrumental in advancing the capabilities of lithography, which is crucial for semiconductor manufacturing.
Collaborations
Chalykh has collaborated with talented coworkers such as Hwanseok Seo and SeongSue Kim. Their combined expertise contributes to the innovative projects at Samsung Electronics.
Conclusion
Roman Chalykh's contributions to extreme ultraviolet lithography exemplify the spirit of innovation in technology. His patents reflect a commitment to advancing the field and improving manufacturing processes.
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