Niefern, Germany

Roland Zaiss

This inventor holds 1 USPTO granted patent. Top assignee: Convac, Ltd.. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roland Zaiss. Retrieved from https://idiyas.com/inventor/roland-zaiss-cc5urzmr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: The Innovations of Roland Zaiss

Introduction

Roland Zaiss is a notable inventor based in Niefern, Germany. He has made significant contributions to the field of technology, particularly in the area of compact disk production. His innovative spirit and dedication to his craft have led to the development of a unique patent.

Latest Patents

Zaiss holds a patent for an "Apparatus for in-line lacquering of compact disks." This invention enhances the efficiency and quality of the lacquering process, which is crucial for producing high-quality compact disks. His work in this area demonstrates his commitment to advancing technology in the media industry.

Career Highlights

Zaiss is currently employed at Convac Ltd., where he continues to innovate and contribute to the field. His experience and expertise have made him a valuable asset to the company. His career reflects a strong focus on improving manufacturing processes and product quality.

Collaborations

One of his notable collaborators is Horst Kunze-Concewitz. Together, they have worked on various projects that aim to enhance the efficiency of production techniques in their industry.

Conclusion

Roland Zaiss is a distinguished inventor whose work has significantly impacted the compact disk production industry. His patent and ongoing contributions at Convac Ltd. highlight his innovative approach and dedication to technological advancement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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