Rumland, Switzerland

Roland W Widmer


Average Co-Inventor Count = 2.6

ph-index = 2

Forward Citations = 84(Granted Patents)


Location History:

  • Rumland, CH (1978)
  • Rumlang, CH (1979)
  • Zurich, CH (1983)

Company Filing History:


Years Active: 1978-1983

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3 patents (USPTO):Explore Patents

Title: The Innovations of Roland W. Widmer

Introduction

Roland W. Widmer is a notable inventor based in Rumland, Switzerland. He has made significant contributions to the field of technology, particularly in the area of sputter etching and optical filters. With a total of three patents to his name, Widmer's work showcases his innovative spirit and technical expertise.

Latest Patents

One of Widmer's latest patents is focused on reactive sputter etching of aluminum. This invention presents an improved sputter etching apparatus designed for etching a substrate with a reactive gas. The enhancement involves utilizing a cryogenic pump as the vacuum means to evacuate the plasma chamber. This improved apparatus is particularly beneficial for the reactive sputter etching of aluminum substrates using highly reactive gases such as boron trichloride. Another significant patent involves a color diffractive subtractive filter master recording. This invention comprises superposed fine-detail multi-level patterns, such as diffraction gratings with specified line spacing dimensions less than 10 micrometers and depth dimensions less than 5 micrometers. The fabrication process can be achieved by linearly adding or subtracting an additional two-level pattern to an existing multi-level pattern.

Career Highlights

Widmer's career is marked by his innovative contributions to the field of technology. His work has not only advanced the understanding of sputter etching but has also paved the way for new applications in optical filtering. His patents reflect a deep understanding of the technical challenges in these areas and a commitment to finding effective solutions.

Collaborations

Throughout his career, Widmer has collaborated with notable colleagues, including Hans W. Lehmann and Michael T. Gale. These collaborations have likely contributed to the development and refinement of his innovative ideas.

Conclusion

Roland W. Widmer's contributions to technology through his patents demonstrate his innovative capabilities and dedication to advancing the field. His work continues to influence the areas of sputter etching and optical filtering, showcasing the importance of innovation in technology.

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