Schönbühl, Switzerland

Roland Kuepfer


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Location History:

  • Schönbühi, CH (2009)
  • Schönbühl, CH (2011)

Company Filing History:


Years Active: 2009-2011

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2 patents (USPTO):Explore Patents

Title: The Innovations of Roland Kuepfer

Introduction

Roland Kuepfer is a notable inventor based in Schönbühl, Switzerland. He has made significant contributions to the field of electrical engineering, particularly in the development of active electromagnetic compatibility (EMC) filters. With a total of two patents to his name, Kuepfer's work focuses on enhancing the safety and efficiency of medical applications and machine tools.

Latest Patents

Kuepfer's latest patents include an "Active EMC Filter for Medical Applications" and an "Active EMC Filter for Machine Tools." The active EMC filter for medical applications is designed to reduce the leakage current typically induced by large phase-to-ground capacitances. This innovative filter may comprise an active shunt module, an impedance converter, or a correction signal generator, making it suitable for both three-phase and single-phase applications. Similarly, the active EMC filter for machine tools serves the same purpose, ensuring safety and efficiency in industrial settings.

Career Highlights

Kuepfer is associated with Schaffner EMV AG, a company known for its expertise in EMC solutions. His work at Schaffner has allowed him to focus on developing cutting-edge technologies that address critical challenges in electrical engineering.

Collaborations

Kuepfer collaborates with Peter Kull, a fellow innovator in the field. Their partnership has contributed to the advancement of EMC technologies, enhancing the reliability and safety of various applications.

Conclusion

Roland Kuepfer's contributions to the field of electrical engineering through his innovative patents demonstrate his commitment to improving safety and efficiency in both medical and industrial applications. His work continues to influence the development of advanced EMC solutions.

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