SAINT-MEDARD EN JALLES, France

Roland Favre

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Roxel France. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roland Favre. Retrieved from https://idiyas.com/inventor/roland-favre

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Roland Favre: Innovator in Pyrotechnic Waste Destruction

Introduction

Roland Favre is a notable inventor based in Saint-Médard-en-Jalles, France. He has made significant contributions to the field of waste management, particularly in the destruction of pyrotechnic waste. His innovative approach addresses the challenges associated with the disposal of energetic materials.

Latest Patents

Favre holds a patent for an "Installation and method for destroying pyrotechnic waste." This invention features an enclosure filled with a liquid medium, designed to facilitate the safe destruction of waste containing energetic materials. The system includes a chamber for combustion, an inlet for waste supply, and a discharge line that effectively manages gases and volatile solid residues produced during the process.

Career Highlights

Roland Favre is associated with Roxel France, a company known for its expertise in propulsion systems and energetic materials. His work at Roxel has allowed him to focus on innovative solutions for waste management, contributing to the company's reputation in the industry.

Collaborations

Favre collaborates with Laurent Meriel, enhancing the development and implementation of innovative technologies in their field.

Conclusion

Roland Favre's contributions to the destruction of pyrotechnic waste highlight his commitment to innovation and environmental safety. His patent reflects a significant advancement in waste management technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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