Ramat Gan, Israel

Roi Moshe Tsukran

This inventor holds 5 USPTO granted patents and 2 published patent applications, plus 1 CIPO patent and 2 EPO patents. Top assignee: Nyxoah Sa. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roi Moshe Tsukran. Retrieved from https://idiyas.com/inventor/roi-moshe-tsukran

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 100.0


 

Average Co-Inventor Count = 1.7

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2019-2026

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5 patents (USPTO):Explore Patents

Title: The Innovative Mind of Roi Moshe Tsukran

Introduction

Roi Moshe Tsukran, an innovative inventor based in Ramat-Gan, Israel, has made significant contributions to the field of technology through his inventive prowess. With three patents to his name, Roi has established himself as a notable figure in his industry.

Latest Patents

Roi's latest invention is a groundbreaking patch technology that showcases his expertise and innovative capacity. This patent represents his commitment to developing solutions that address contemporary challenges in the market.

Career Highlights

Currently, Roi is employed at Nyxoah SA, a prominent company focused on advancing health technologies. His work there involves pioneering new inventions that are likely to impact the industry positively. With his three patents, he has showcased a distinct ability to merge creativity with practicality.

Collaborations

Throughout his career, Roi has collaborated with talented individuals, including Yoel Ben Yosef and Ronen Adimor. These partnerships have enriched his work and fostered an environment of shared innovation, leading to impactful outcomes in their respective projects.

Conclusion

Roi Moshe Tsukran stands as a testament to the spirit of innovation in today's technological landscape. With his impressive contributions and collaborative efforts, he continues to push the boundaries of what is possible, inspiring future inventors in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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