Burlington, VT, United States of America

Rogert K Leidy

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2006.


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovations of Rogert K Leidy

Introduction

Rogert K Leidy is a notable inventor based in Burlington, VT (US). He has made significant contributions to the field of optical technology, particularly in the area of photolithography processing. His innovative work has led to the development of a unique optical pellicle that enhances the efficiency and effectiveness of photomask protection.

Latest Patents

Rogert K Leidy holds a patent for a monolithic optical pellicle. This invention is designed to protect a photomask during photolithography processing. The monolithic optical pellicle consists of a pellicle plate with a recessed central portion that is integrally formed with a perimeter frame. This design ensures that the pellicle is a one-piece optical component, minimizing distortions and maximizing durability. The material used in the pellicle is transparent to exposure fields at approximately 157 nm wavelengths, making it ideal for its intended application.

Career Highlights

Rogert K Leidy is associated with International Business Machines Corporation (IBM), where he has contributed to various projects and innovations. His work has been instrumental in advancing optical technologies that are crucial for modern manufacturing processes.

Collaborations

Throughout his career, Rogert has collaborated with talented individuals such as Emily Gallagher and Michael James Lercel. These collaborations have fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Rogert K Leidy's contributions to optical technology, particularly through his patented monolithic optical pellicle, demonstrate his commitment to innovation. His work continues to influence the industry and pave the way for future advancements in photolithography processing.

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