Vinton, IA, United States of America

Roger R Shiel

This inventor holds 1 USPTO granted patent. Top assignee: Rockwell Collins, Inc.. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roger R Shiel. Retrieved from https://idiyas.com/inventor/roger-r-shiel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Roger R. Shiel

Introduction

Roger R. Shiel is a notable inventor based in Vinton, Iowa. He has made significant contributions to the field of microelectronics through his innovative patent. His work focuses on enhancing the durability and reliability of electronic components, particularly semiconductor chips.

Latest Patents

Roger R. Shiel holds a patent for a method of applying a protective layer to a microelectronic component. This method is designed to protect electronic components from damage, specifically targeting semiconductor chips. The process involves applying a first protective substance to the outer surface of the semiconductor chip, which has a coefficient of thermal expansion similar to that of the chip itself. Following this, a second substance can be applied to the first protective layer, ensuring that the semiconductor chip remains unharmed during the application process.

Career Highlights

Roger R. Shiel is associated with Rockwell Collins, Inc., where he has contributed to various projects in the field of microelectronics. His expertise and innovative approach have made him a valuable asset to the company.

Collaborations

Roger has worked alongside his coworker, Brian K. Smith, contributing to advancements in their field. Their collaboration has fostered an environment of innovation and creativity.

Conclusion

Roger R. Shiel's contributions to the field of microelectronics through his patent demonstrate his commitment to innovation and excellence. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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