Milton, VT, United States of America

Roger Lawrence Barr

This inventor holds 4 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1997-2002.


% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 4

Forward Citations = 50(Granted Patents)


Company Filing History:


Years Active: 1997-2002

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4 patents (USPTO):Explore Patents

Title: Innovations by Roger Lawrence Barr

Introduction

Roger Lawrence Barr is an accomplished inventor based in Milton, VT (US). He holds a total of 4 patents and has made significant contributions to the field of semiconductor device fabrication. His work focuses on enhancing the robustness and accuracy of alignment marks used in lithographic systems.

Latest Patents

One of Barr's latest patents is centered around a more robust alignment mark design. This innovation introduces alignment marks that are substantially resistant to degradation caused by semiconductor device fabrication steps. The design employs a series of staggered geometrical shapes, which provide a checkerboard alignment mark. These shapes are sized to be within the resolving capability of the exposure tool while remaining smaller than that of the alignment system. This design results in a more symmetrical signal, which is less susceptible to variability from prior processing steps compared to standard mark designs.

Another notable patent involves a lithographic print bias/overlay target and applied metrology. This print bias target is imaged in a single layer of light-sensitive material and consists of concentric geometric shapes with isolated edges. Each target region features a different image structure than its adjacent regions. The positioning of isolated edges in the print bias target is determined relative to corresponding edges in the design image. This innovation allows for improved focus and exposure settings in lithographic systems, minimizing print bias and identifying imaging aberrations.

Career Highlights

Roger Lawrence Barr has had a distinguished career at International Business Machines Corporation (IBM). His work has significantly advanced the field of semiconductor technology, particularly in the areas of lithography and alignment systems. His patents reflect a deep understanding of the challenges faced in semiconductor fabrication and a commitment to developing solutions that enhance performance and reliability.

Collaborations

Throughout his career, Barr has collaborated with notable colleagues, including Patrick J Couillard and Robert Truman Froebel. These collaborations have contributed to the innovative advancements in the technologies he has developed.

Conclusion

Roger Lawrence Barr's contributions to semiconductor technology through his patents and innovations have made a lasting impact on the industry. His work continues to influence the development of more efficient and reliable semiconductor devices.

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