Bethel, CT, United States of America

Roger C Rasch


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2003-2004

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Roger C. Rasch

Introduction

Roger C. Rasch, an accomplished inventor based in Bethel, Connecticut, has made significant strides in the field of adhesive formulations and resin technologies. With a total of two patents to his name, Rasch has demonstrated a commitment to innovation and excellence in his work.

Latest Patents

Rasch's latest patents focus on stable liquid melamine urea formaldehyde (MUF) resins and their application in adhesives. His work revolves around a groundbreaking process for preparing a liquid MUF resin that maintains long-term stability. This invention features a high content of formaldehyde and melamine, essential for producing durable materials. Additionally, it includes a liquid suspension hardener comprised of a catalyst, a thickener, a filler, and water. The adhesive composition developed from this resin is specifically optimized for wood bonding through the incorporation of a hardener.

Career Highlights

Roger C. Rasch is associated with Cytec Technology Corporation, where he has contributed his expertise in adhesive technologies. His role at the company has enabled him to push the boundaries of innovation, particularly in the development of advanced resin formulations.

Collaborations

During his tenure at Cytec Technology Corporation, Rasch has worked alongside his coworker, Huide Dennis Zhu. Their collaboration has likely fostered an environment conducive to creativity and problem-solving, enhancing the development of new adhesive solutions.

Conclusion

Roger C. Rasch's inventive spirit and dedication to the field of adhesive formulations and resin technologies have resulted in impactful patents that advance material stability and bonding solutions. His work exemplifies the importance of innovation in enhancing industrial applications and demonstrates how individual inventors can contribute significantly to their fields.

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