Roger A Quon

Title: Roger A Quon: Innovator in Etch Masking Technology

Introduction

Roger A Quon is a notable inventor based in Rhinebeck, NY (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in etch masking technology. His innovative approach has led to the development of a unique patent that enhances the precision of pattern formation in tight pitch configurations.

Latest Patents

Roger A Quon holds a patent titled "Self aligned pattern formation post spacer etchback in tight pitch configurations." This patent describes a method of forming a structure for etch masking. The process includes forming first dielectric spacers on the sidewalls of a plurality of mandrel structures and creating non-mandrel structures in the space between adjacent first dielectric spacers. The method further involves forming second dielectric spacers on the sidewalls of an etch mask, which has a window that exposes a connecting portion of a centralized first dielectric spacer. The connecting portion is then removed, allowing for the selective removal of mandrel and non-mandrel structures to provide an effective etch mask. This innovative technique results in an opening that connects a first trench corresponding to the mandrel structures and a second trench corresponding to the non-mandrel structures.

Career Highlights

Roger A Quon is currently associated with Tessera LLC, where he continues to push the boundaries of technology in the semiconductor industry. His work has been instrumental in advancing etch masking techniques, which are crucial for the fabrication of integrated circuits.

Collaborations

Throughout his career, Roger has collaborated with several talented individuals, including Sean D Burns and Lawrence Alfred Clevenger. These collaborations have fostered an environment of innovation and have contributed to the success of various projects within the company.

Conclusion

Roger A Quon is a distinguished inventor whose work in etch masking technology has made a significant impact on the semiconductor industry. His innovative patent showcases his expertise and commitment to advancing technology.