Kfar Bin Nun, Israel

Roey Zuitlin

This inventor holds 1 USPTO granted patent. Top assignee: Apple Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roey Zuitlin. Retrieved from https://idiyas.com/inventor/roey-zuitlin-26fj60hb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Roey Zuitlin and Thermal Reference Correction for Depth Mapping.

Introduction

Roey Zuitlin is an inventor based in Kfar Bin Nun, Israel. His patent work includes a method for improving depth mapping by accounting for temperature-related changes in a projector.

Latest Patents

Zuitlin is associated with 1 patent, titled “Thermal Reference Correction.” The method begins by operating a projector at a first temperature and projecting a pattern of optical radiation onto a reference plane. After capturing an image of the pattern, an optical and thermal model of the projector is used to compute reference images corresponding to different projector temperatures.

The projector then projects the pattern onto a scene while its temperature is measured. A second image captures the pattern on the scene, and the method selects the reference image corresponding to the measured temperature. It computes a depth map by comparing the scene image with that selected reference image.

Career Highlights

Zuitlin is associated with Apple Inc. His patent describes a temperature-aware approach to depth mapping that uses modeled reference images to account for projector behavior at different temperatures.

Collaborations

Nir Goldfriend and Yuval Vardi are identified as Zuitlin’s coworkers. The provided information does not specify their roles in the patent.

Conclusion

Roey Zuitlin’s patent focuses on improving depth mapping by adapting reference-image comparisons to the projector’s measured temperature.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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