Russange, France

Rodolphe Mauchauffe

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Luxembourg Institute of Science and Technology. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rodolphe Mauchauffe. Retrieved from https://idiyas.com/inventor/rodolphe-mauchauffe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Innovations of Rodolphe Mauchauffe in Plasma Deposition Technology

Introduction

Rodolphe Mauchauffe, an inventive mind based in Russange, France, has made significant contributions to the field of material science. With a strong interest in innovative methods for surface treatment, Rodolphe has one notable patent to his name, which exemplifies his expertise in plasma deposition technology.

Latest Patents

Rodolphe Mauchauffe holds a patent for a "Plasma deposition method for catechol/quinone functionalised layers." This invention introduces a solvent-free plasma method for depositing an adherent layer enriched with catechol and/or quinone functional groups onto various substrates. The patented method utilizes precursors containing at least a quinone group and a catechol group, which can be protected or unprotected. Specifically, the quinone group is identified as a 1,2-benzoquinone, while the catechol group is characterized as 1,2-dihydroxybenzene. This method opens new avenues for advanced surface modifications in both inorganic and organic materials.

Career Highlights

Currently, Rodolphe is contributing his skills and knowledge as part of the Luxembourg Institute of Science and Technology. His work in this esteemed research institution allows him to collaborate with other professionals and continue his exploration of innovative technologies in material sciences.

Collaborations

At the Luxembourg Institute of Science and Technology, Rodolphe collaborates with talented researchers, including Christophe Detrembleur and Cecile Vandeweerdt. Their joint efforts play a critical role in driving forward innovative research and development in the field of plasma technologies and surface functionalization.

Conclusion

Rodolphe Mauchauffe's contributions to the patent landscape, particularly through his unique plasma deposition method, highlight the importance of innovative thinking in material science. His work not only advances academic knowledge but also has practical implications for various industries seeking advanced solutions for surface treatments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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