Company Filing History:
Years Active: 2014
Title: Rockyou Park: Innovator in Image Correction Technology
Introduction
Rockyou Park is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of image processing, particularly through his innovative patent related to exposure measurement.
Latest Patents
Rockyou Park holds a patent for an "Exposure measuring method and apparatus based on composition for automatic image correction." This invention provides a composition-based method for measuring the exposure degree of an object within an image. The process involves receiving an input image, measuring the exposure amount of a pixel located in a region determined by the composition, and determining the exposure degree of the object based on the measured exposure amount. This technology enhances the accuracy of image correction, making it a valuable asset in the field.
Career Highlights
Rockyou Park is currently employed at Nhn Corporation, where he continues to develop innovative solutions in image processing. His work has garnered attention for its practical applications and potential to improve image quality in various industries.
Collaborations
Some of his coworkers include Jowon Yi and Sung Tak Cho, who contribute to the collaborative environment at Nhn Corporation. Their teamwork fosters innovation and drives the development of cutting-edge technologies.
Conclusion
Rockyou Park is a distinguished inventor whose work in exposure measurement technology has the potential to revolutionize image correction processes. His contributions to the field are noteworthy and reflect his commitment to innovation.