This inventor holds 2 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignees: The H.d. Lee Company, Inc., Vf Corporation. Active years: 2019-2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019-2022
Title: The Innovative Mind of Robin O'Neill Fisher
Introduction
Robin O'Neill Fisher is a notable inventor based in Atlanta, GA, with a focus on garment design and aesthetics. He holds two patents that showcase his innovative approach to enhancing the visual appeal of clothing. His work reflects a deep understanding of how design can influence perception and style.
Latest Patents
Fisher's latest patents include "Anatomy Shading for Garments." In one embodiment, a garment includes a substrate and a pattern that emulates the contours of an ideally proportioned body, giving observers the impression of ideal proportions. Another aspect of his patent involves systems and methods for anatomy shading, which refers to the deliberate manipulation or addition of shading to a garment. This technique aims to change the perceived shape of the wearer toward a desired appearance, enhancing the overall aesthetic of the garment.
Career Highlights
Throughout his career, Fisher has worked with prominent companies such as VF Corporation and The H.D. Lee Company, Inc. His experience in these organizations has allowed him to refine his skills and contribute significantly to the field of garment innovation.
Collaborations
Fisher has collaborated with talented individuals in the industry, including Donald D. Hoffman and Darren J. Peshek. These partnerships have likely enriched his creative process and led to the development of groundbreaking ideas in garment design.
Conclusion
Robin O'Neill Fisher's contributions to the world of fashion through his innovative patents demonstrate his commitment to enhancing garment aesthetics. His work continues to influence the industry and inspire future innovations in clothing design.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile