Bodman-Ludwigshafen, Germany

Robin Kirsten

This inventor holds 1 USPTO granted patent. Top assignee: Basf Aktiengesellschaft. Active years: 1996.


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Robin Kirsten

Introduction

Robin Kirsten is a notable inventor based in Bodman-Ludwigshafen, Germany. He has made significant contributions to the field of polymer chemistry, particularly in the preparation of polymers from C2-C10 alk-1-enes. His work has implications for various industrial applications, showcasing the importance of innovation in material science.

Latest Patents

Robin Kirsten holds a patent for the "Preparation of polymers of C.sub.2 -C.sub.10 -alk-1-enes using racemic." This patent describes a process for preparing these polymers at pressures ranging from 0.5 to 3000 bar and temperatures from -50°C to 300°C. The catalyst system utilized in this process includes a metallocene complex, which is crucial for the polymerization process.

Career Highlights

Kirsten's career is marked by his dedication to advancing polymer technology. His innovative approach to using metallocene complexes has opened new avenues for the synthesis of high-performance polymers. His work at BASF Aktiengesellschaft has positioned him as a key player in the field of polymer research and development.

Collaborations

Throughout his career, Robin Kirsten has collaborated with esteemed colleagues such as Franz Langhauser and Jurgen Kerth. These collaborations have fostered a productive environment for innovation and have contributed to the success of various projects within the company.

Conclusion

In summary, Robin Kirsten's contributions to polymer chemistry and his innovative patent work exemplify the impact of dedicated inventors in advancing technology. His collaborations and career achievements continue to inspire future innovations in the field.

Profile summary based on public USPTO records.
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