Company Filing History:
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Years Active: 1998-1999
Title: Inventor Profile: Robert YS Huang
Introduction
Robert YS Huang is an accomplished inventor based in Ocoee, Florida, United States. With two patents to his name, he has made significant contributions in the field of integrated circuit fabrication and MOSFET device design. His innovative approaches have enhanced the performance and reliability of semiconductor devices.
Latest Patents
Huang's latest patents reflect his expertise and ingenuity in engineering. The first patent, titled "Process for improving device yield in integrated circuit fabrication," addresses the challenges of undesirable bird's beak pull back caused by ion implantation damage. This issue is alleviated through a rapid thermal annealing step prior to chemical etching, leading to improved device yield.
The second patent, "Drain extension regions in low voltage lateral DMOS devices," introduces a self-aligned region extending from the drain of MOSFET devices. This region has a lower dopant concentration than the drain itself. The innovation notably enhances breakdown voltage while minimizing excessive on-resistance, thus improving device performance.
Career Highlights
Robert YS Huang has had a notable career with reputed firms in the technology sector. He has worked with National Semiconductor Corporation, a leader in the semiconductor industry, and Lucent Technologies Inc., which is known for its advancements in telecommunications and networking. His expertise and contributions in these companies have been instrumental in driving innovations in the field.
Collaborations
Throughout his career, Huang has collaborated with talented individuals, including Monir H El-Diwany and David Kou-Fong Hwang. These partnerships have enriched his work and fostered a collaborative environment conducive to innovation and problem-solving.
Conclusion
Robert YS Huang's innovative spirit and technical proficiency in integrated circuit fabrication and MOSFET device design have led to valuable patents that enhance the performance of semiconductor devices. His professional journey and collaborations reflect a commitment to advancing technology and contributing to the field of electronics. With his continued efforts, Huang remains a notable figure in the world of innovations and inventions.