Robert Wu

Title: The Innovations of Robert Wu

Introduction

Robert Wu is an accomplished inventor based in San Diego, California. He has made significant contributions to the field of micro-fabrication, particularly in the development of advanced materials for plasma etching processes. His innovative work has led to the creation of a unique patent that enhances the efficiency and effectiveness of plasma chambers.

Latest Patents

Robert Wu holds a patent for a "Silicon carbide gas distribution plate and RF electrode for plasma etch chamber." This invention features a showerhead designed for use in a capacitively-coupled plasma chamber. The showerhead is constructed from a low resistivity bulk layer that is coated with chemical vapor deposition (CVD) silicon carbide (SiC). The bulk low resistivity material can include graphite, silicon carbide, converted graphite, or a combination of silicon carbide and graphite. Sintered silicon carbide may also be utilized as the bulk material, providing a robust and efficient solution for plasma etching applications.

Career Highlights

Robert Wu is currently employed at Advanced Micro-Fabrication Equipment, Inc. Asia, where he continues to push the boundaries of micro-fabrication technology. His work focuses on developing innovative solutions that improve the performance of plasma etching equipment. With a strong background in materials science and engineering, Wu has established himself as a key player in the industry.

Collaborations

Throughout his career, Robert Wu has collaborated with various professionals in the field. One notable coworker is Tuqiang Q Ni, with whom he has worked closely on several projects. Their combined expertise has contributed to advancements in micro-fabrication technologies.

Conclusion

Robert Wu's contributions to the field of micro-fabrication and his innovative patent demonstrate his commitment to advancing technology in plasma etching processes. His work continues to influence the industry and pave the way for future innovations.