Robert P Gleason

Title: The Innovative Contributions of Robert P. Gleason

Introduction

Robert P. Gleason is a notable inventor based in San Carlos, CA (US). He has made significant contributions to the field of photolithography, particularly through his innovative patent related to mask patterns. His work has implications for the manufacturing processes in various high-tech industries.

Latest Patents

Robert P. Gleason holds a patent for "Mask patterns for use in multiple-exposure lithography." This patent describes a method for determining mask patterns to be used on photo-masks in a multiple-exposure photolithographic process. The method involves using an initial mask pattern intended for a single-exposure process alongside a target pattern to derive both a first and a second mask pattern for multiple exposures. Notably, the first mask pattern includes a first feature, while the second mask pattern includes a second feature that overlaps an intersection between features in the initial mask pattern. Additionally, both mask patterns exhibit at least one decreased spatial frequency relative to the initial mask pattern along at least one direction.

Career Highlights

Robert P. Gleason is associated with Luminescent Technologies, Inc., where he applies his expertise in photolithography. His innovative approach to mask patterns has positioned him as a valuable asset in the field. With a total of 1 patent, his contributions are recognized within the industry.

Collaborations

Robert has collaborated with notable colleagues, including Andrew J. Moore and Bennett W. Olson. Their combined efforts in research and development have further advanced the field of photolithography.

Conclusion

Robert P. Gleason's innovative work in photolithography exemplifies the impact of inventive thinking in technology. His contributions continue to influence manufacturing processes and highlight the importance of innovation in the industry.