Company Filing History:
Years Active: 1998-2000
Title: **Inventor Robert O. Frenette: Pioneering Dual Work Function CMOS Technology**
Introduction
Robert O. Frenette is a notable inventor based in Burlington, Vermont. With a total of two patents to his name, he has made significant contributions to the field of semiconductor technology. His innovative work primarily focuses on the development of dual work function CMOS devices, a crucial advancement in integrated circuit design.
Latest Patents
Robert O. Frenette’s latest patents revolve around a dual work function CMOS device and the methods associated with its production. The disclosed method entails a series of precise steps: firstly, a first layer of a doped material—either n-type or p-type—is deposited over a substrate designated for doping. The areas intended for opposite doping are then defined, followed by the deposition of a second layer made from an oppositely doped material across the entire surface. The entire CMOS device is subjected to a high-temperature drive-in anneal, which accelerates the diffusion of the dopants into adjacent areas, effectively doping the gate polysilicon and channels with the desired materials. Additionally, a nitride barrier layer may be incorporated to mitigate the diffusion of the second dopant into the substrate underneath the first layer.
Career Highlights
Robert is currently employed at International Business Machines Corporation (IBM), where he engages in cutting-edge research and development in semiconductor technologies. His expertise has positioned him as a key player in advancing CMOS technology, which is vital for modern electronic devices.
Collaborations
During his career, Robert O. Frenette has collaborated with notable colleagues in his field, including Dale P. Hallock and Stephen A. Mongeon. Their combined efforts have driven innovation and deepened the understanding of CMOS architectures.
Conclusion
In conclusion, Robert O. Frenette stands out as a significant figure in the realm of electronics with his innovative work on dual work function CMOS devices. His contributions continue to influence the semiconductor industry, showcasing the importance of collaboration and dedicated research in the advancement of technology.
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