Company Filing History:
Years Active: 1996-1999
Title: The Innovative Contributions of Robert Newell Walters
Introduction
Robert Newell Walters is a notable inventor based in Boise, ID (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative spirit and technical expertise. His work focuses on enhancing the processes involved in semiconductor fabrication, which is crucial for the advancement of electronic devices.
Latest Patents
Walters' latest patents include the "Wafer gap conductivity cell for characterizing process vessels" and "A conductivity cell for use in determining ionic concentrations in the gap between two semiconductor substrates or wafers." The wafer gap conductivity cell consists of two flat electrodes separated by a fixed gap, fabricated from wafers of the same type and dimensions used as semiconductor device substrates. The surfaces of these wafer electrodes are coated with a conductive material. This cell is designed to be placed in a wafer cassette or holder, allowing for the characterization of processes used during semiconductor device fabrication. It assists in investigating the effects of different process vessel designs on these processes. Additionally, his "Directed flow fluid rinse trough" invention provides a novel solution for thorough and uniform rinsing of planar items, requiring less rinse fluid than previous designs.
Career Highlights
Throughout his career, Walters has worked with various companies, including Scp Global Technologies, Inc. His experience in the semiconductor industry has allowed him to develop innovative solutions that address critical challenges in the field.
Collaborations
Walters has collaborated with notable professionals such as Paul G Lindquist and Steven N Kempka, contributing to the advancement of semiconductor technologies through teamwork and shared expertise.
Conclusion
Robert Newell Walters is a distinguished inventor whose contributions to semiconductor technology have made a lasting impact. His innovative patents reflect his commitment to improving fabrication processes and enhancing the efficiency of semiconductor devices.