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Scp Global Technologies, Inc.

Robert Newell Walters

Paul G Lindquist

Steven N Kempka

A conductivity cell for use in determining ionic concentrations in the gap between two semiconductor substrates or wafers. The wafer gap conductivity cell is composed of two flat electrodes separated by a fixed gap. The electrodes are fabricated from wafers of the same type and dimensions used as semiconductor device substrates. All or a portion of the surfaces of the wafer electrodes are coated with a conductive material. The wafer gap conductivity cell is placed in a wafer cassette or other suitable wafer holder, whose other slots are filled with wafers which are to be cleaned or subjected to another fabrication process. The cell can be used to characterize the processes used during the fabrication of semiconductor devices and assist in investigating the effect on the processes of different process vessel designs.

Wafer gap conductivity cell for characterizing process vessels and

Novel rinse troughs accomplish thorough uniform rinsing. The tanks are suitable for one or more essentially planar items having substantially the same shape. The troughs ensure that each surface is rinsed uniformly. The new troughs also require less rinse fluid to accomplish a thorough rinse than prior art troughs.

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Boise, ID, United States of America

Robert Newell Walters