This inventor holds 2 USPTO granted patents. Top assignee: Lam Research Corporation. Active years: 2004-2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Fremont, CA (US) (2004)
- Newark, CA (US) (2005)
Company Filing History:
Years Active: 2004-2005
Title: Innovations by Robert L. Anderson, II
Introduction
Robert L. Anderson, II is a notable inventor based in Fremont, CA, who has made significant contributions to the field of chemical mechanical planarization (CMP). With a total of 2 patents, his work focuses on enhancing the efficiency and effectiveness of polishing processes in semiconductor manufacturing.
Latest Patents
Anderson's latest patents include a "Method of and platen for controlling removal rate characteristics in chemical mechanical planarization." This invention addresses the need for low-cost polishing pads while optimizing fluid usage and controlling the removal rate characteristics. The platen configuration he developed provides fluid pressure control, which minimizes fluid leakage and helps manage the inflection point of the removal rate characteristic.
Another significant invention is the "Method and apparatus for an air bearing platen with raised topography." This CMP apparatus enhances removal rate uniformity by utilizing a polishing belt and a specially designed platen. The circular shim section on the platen's top surface allows for precise control over the edge removal rate of the wafer, depending on the pressure applied to the polishing belt.
Career Highlights
Robert L. Anderson, II is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to develop innovative solutions that address critical challenges in the manufacturing process.
Collaborations
Throughout his career, Anderson has collaborated with talented individuals such as Robert Charatan and Travis R. Taylor. These collaborations have contributed to the advancement of technologies in the semiconductor field.
Conclusion
Robert L. Anderson, II's contributions to the field of chemical mechanical planarization through his innovative patents demonstrate his commitment to improving semiconductor manufacturing processes. His work continues to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile