Robert J Mason

Title: The Innovations of Robert J Mason

Introduction

Robert J Mason is an accomplished inventor based in Brentwood, NH (US). He has made significant contributions to the field of semiconductor equipment, particularly through his innovative patents. With a total of two patents to his name, Mason has demonstrated a commitment to advancing technology in his industry.

Latest Patents

One of Mason's latest patents involves a SiC coating in an ion implanter. This invention features a coating of low resistivity silicon carbide on one or more of the conductive surfaces that are exposed to ions. For instance, ions are generated in an ion source chamber, and the interior surfaces of the walls are coated with low resistivity silicon carbide. Since silicon carbide is hard and resistant to sputtering, this innovation may reduce the amount of contaminant ions that are introduced into the ion beam extracted from the ion source chamber. In some embodiments, the extraction electrodes are also coated with silicon carbide to minimize the contaminant ions introduced by these components.

Career Highlights

Mason is currently employed at Varian Semiconductor Equipment Associates, Inc., where he continues to develop and refine his innovative ideas. His work has had a notable impact on the semiconductor industry, particularly in enhancing the efficiency and effectiveness of ion implantation processes.

Collaborations

Mason has collaborated with several talented individuals in his field, including Shardul Patel and Robert H Bettencourt. These collaborations have likely contributed to the success of his projects and the advancement of technology in semiconductor equipment.

Conclusion

Robert J Mason is a notable inventor whose work in semiconductor technology has led to significant advancements. His innovative patents, particularly in ion implantation, showcase his expertise and dedication to improving industry standards.