This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1986-1987.
Company Filing History:
Years Active: 1986-1987
Title: Innovations of Robert J Capwell
Introduction
Robert J Capwell is a notable inventor based in Vestal, NY (US). He has made significant contributions to the field of electroless plating, holding 2 patents that showcase his innovative approaches to metal deposition processes. His work has implications for various industries, particularly in improving the quality and efficiency of plating techniques.
Latest Patents
One of Capwell's latest patents focuses on a method for copper plating. In this invention, copper is plated onto a substrate from an electroless plating bath that maintains a mix potential relative to a saturated calomel electrode of about minus 630 to about minus 675 millivolts at a temperature of approximately 73 degrees Celsius. The mix potential of the bath is monitored and adjusted during the plating process to ensure it remains within this range, effectively reducing the number of plating void defects.
Another significant patent by Capwell is related to an electroless plating bath monitor. This invention involves a method and apparatus for determining the deposition capability of an electroless metal plating bath. It does this by monitoring the difference in instantaneous electrical potential between two test coupons immersed in the bath. One coupon is seeded to initiate plating, while the other has a surface of the bath metal. The magnitude of the potential difference and its change over time during concurrent immersion of both coupons indicate the probable rate and quality of the bath deposition onto workpieces.
Career Highlights
Robert J Capwell is associated with the International Business Machines Corporation (IBM), where he has contributed to advancements in plating technologies. His work has been instrumental in enhancing the performance and reliability of electroless plating processes.
Collaborations
Throughout his career, Capwell has collaborated with notable colleagues, including Robert G Rickert and Donald G McBride. These collaborations have fostered a productive environment for innovation and development in their respective fields.
Conclusion
Robert J Capwell's contributions to the field of electroless plating demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of plating processes and a desire to improve industry standards. His work continues to influence advancements in metal deposition technologies.