Robert Henry Pagliaro

Title: Innovations of Robert Henry Pagliaro

Introduction

Robert Henry Pagliaro is an accomplished inventor based in Mesa, AZ (US). He has made significant contributions to the field of wafer cleaning technology. With a total of 2 patents, his work focuses on improving the efficiency and effectiveness of wafer cleaning processes.

Latest Patents

Pagliaro's latest patents include a wafer cleaning apparatus and a wafer cleaning method using the same. The primary objective of this invention is to provide a cleaning apparatus that minimizes the amount of dissolved oxygen without the use of hydrogen peroxide. This innovation aims to reduce wafer deformation and silicon consumption. The apparatus consists of a first thin film contactor that receives a drug solution for removing an oxide film or ultra-pure water. It separates and discharges gas dissolved in the solution. A second thin film contactor processes the discharged solution, while a vacuum pump expels the separated gas. Finally, a process vessel stores the cleaned solution for further use.

Career Highlights

Pagliaro has established himself as a key figure in his field through his innovative work at Apet. His inventions have contributed to advancements in semiconductor manufacturing and wafer processing technologies.

Collaborations

He has collaborated with notable coworkers, including Sung Ho Hong and Jin Tae Kim, to further enhance the development of wafer cleaning technologies.

Conclusion

Robert Henry Pagliaro's contributions to wafer cleaning technology demonstrate his commitment to innovation and efficiency in the semiconductor industry. His patents reflect a deep understanding of the challenges faced in wafer processing and offer practical solutions to improve manufacturing practices.