This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Lam Research Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: The Innovative Contributions of Robert G O'Neill
Introduction
Robert G O'Neill is a notable inventor based in Hayward, California. He has made significant contributions to the field of substrate processing systems. His innovative designs have led to advancements in technology that enhance efficiency and performance.
Latest Patents
One of Robert G O'Neill's key patents is titled "Wide-coverage edge ring for enhanced shielding in substrate processing systems." This patent describes a wide-coverage edge ring that is designed to be arranged above a bottom ring in a substrate processing chamber. The edge ring features an upper surface and a lower surface that includes a step extending downward, which interfaces with a pocket defined by the bottom ring and chamber liner. The design includes an inner diameter, a ledge, and an outer diameter with a projection that extends radially outward. This innovative design aims to improve the shielding capabilities within substrate processing systems.
Career Highlights
Robert G O'Neill is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to focus on developing cutting-edge technologies that are essential for modern manufacturing processes.
Collaborations
Throughout his career, Robert has collaborated with talented individuals such as Giovanni Paolo Gajudo and Shang-I Chou. These collaborations have fostered an environment of innovation and creativity, leading to the development of advanced technologies in the field.
Conclusion
Robert G O'Neill's contributions to substrate processing systems through his innovative patent and work at Lam Research Corporation highlight his importance in the field of technology. His dedication to enhancing efficiency and performance continues to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
