This inventor holds 9 USPTO granted patents. Top assignee: Hughes Aircraft Company. Active years: 1977-1991.
Company Filing History:
Years Active: 1977-1991
Title: **The Innovative Mind of Robert G. Brault**
Introduction
Robert G. Brault, based in Santa Monica, CA, is a noted inventor with a remarkable portfolio of nine patents. His work primarily focuses on advancements in lithography materials and methods, especially within the high-tech sector.
Latest Patents
Brault's most recent patents showcase his innovative contributions to the field. One of his key inventions is related to a polysiloxane resist for ion beam and electron beam lithography. This method presents a high-temperature imaging resist layer suitable for multilayer resist systems. The process involves applying a thick planarizing resist layer onto a substrate to create a smooth surface, followed by a thinner layer of solvent-soluble polysilsesquioxane polymer resist. This resist is designed to maintain solvent solubility even at elevated temperatures of up to 250°C, avoiding cross-linking by limiting the hydroxyl or alkoxy content to just 0.05 weight percent. Additionally, he developed a method for creating an image with a positive resist using poly(methacrylic anhydride). This process incorporates heating, irradiation, and the development of resist layers through specific chemical solutions.
Career Highlights
Robert G. Brault’s career flourished while working at Hughes Aircraft Company, a prominent player in the aerospace and defense sectors. His extensive research and innovative patents have contributed significantly to the advancements in lithography technologies.
Collaborations
Throughout his career, Brault has collaborated with notable colleagues, including Leroy J. Miller and Cesar C. DeAnda. This collaborative spirit has enabled him to push the boundaries of innovation and improve lithography processes.
Conclusion
Robert G. Brault stands out as a distinguished inventor whose contributions have greatly influenced the field of material science and lithography. With a focus on high-performance resist materials and methods, his patents reflect a deep understanding of both theoretical and practical aspects of innovation. His ongoing work continues to impact industries reliant on advanced imaging techniques.