Clarence, NY, United States of America

Robert F Aycock


Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1985-1986

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Robert F Aycock

Introduction: Robert F Aycock, an accomplished inventor based in Clarence, NY, has made significant strides in the field of plasma etching and semiconductor technology. With a total of two patents to his name, his work has had a profound impact on the manufacturing processes used in the integrated circuits industry.

Latest Patents: Among his latest innovations, Aycock has introduced a boron trifluoride system for plasma etching of silicon dioxide. This method utilizes BF.sub.3 based mixtures and enhances the etching rate of silicon dioxide when trace amounts of formaldehyde are included in the process. Notably, this adjustment minimally affects the silicon itself while improving efficiency. Additionally, his spin-on dopant method represents a groundbreaking single-step procedure for boron dopant diffusion. This technique allows for both deposition and drive-in diffusions within a single furnace process, achieving impressive sheet resistivities and penetration accuracy of 4%. This innovative approach eliminates the traditional need for two separate furnace processes, resulting in greater uniformity and efficiency in p-type diffusion.

Career Highlights: Robert F Aycock's career is marked by his tenure at Allied Corporation, where he has contributed to the development of key technologies in semiconductor fabrication. His innovative mindset and technical expertise have earned him recognition in the industry, particularly in relation to advancements in etching processes that are vital for integrated circuit manufacture.

Collaborations: Throughout his career, Aycock has worked alongside notable colleagues such as Bruce H Justice and Marie C Flanigan. These collaborations have undoubtedly enriched his research and development efforts, leading to successful patents that push the boundaries of current technology.

Conclusion: Robert F Aycock's contributions to innovation in plasma etching and semiconductor technology showcase his dedication and ingenuity as an inventor. His latest patents reflect a commitment to improving the efficiency of manufacturing processes, impacting the future of integrated circuit production. As technology continues to evolve, the work of inventors like Aycock will remain at the forefront of innovation in the industry.

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