Company Filing History:
Years Active: 1991-1992
Title: Innovations of Robert D Varrin, Jr.
Introduction
Robert D Varrin, Jr. is a notable inventor based in Newark, DE (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to advanced materials.
Latest Patents
His latest patents include a method for plasma-induced, in-situ generation, transport, and use or collection of reactive precursors. This invention involves creating a beam or flow of a reactive or metastable precursor, such as a hydride or organometallic compound, which is used to treat substrates like semiconductor layers or solar cells. The apparatus designed for this process consists of three zones, where microwave energy generates a reactive gas rich in free radicals, which then interacts with a target to form the precursor. The system allows for the collection of precursors for future use, enhancing the efficiency of semiconductor production.
Another significant patent involves an apparatus for producing compound semiconductor thin films. This invention features a closed-loop system that supplies gaseous species to a reaction chamber, utilizing hot and cold traps to control the delivery of materials. A thermosiphon is employed to facilitate the flow of gaseous species, specifically for the formation of copper indium diselenide semiconductor thin films.
Career Highlights
Robert D Varrin, Jr. is affiliated with the University of Delaware, where he continues to advance research in semiconductor technologies. His work has contributed to the development of innovative methods for producing high-quality semiconductor materials.
Collaborations
He has collaborated with esteemed colleagues such as Henry C Foley and Sourav K Sengupta, further enhancing the impact of his research and inventions.
Conclusion
Robert D Varrin, Jr. exemplifies the spirit of innovation in the field of semiconductor technology, with his patents paving the way for advancements in material science. His contributions are vital to the ongoing evolution of semiconductor applications.