Sylvania, OH, United States of America

Robert D Heetfield

This inventor holds 1 USPTO granted patent. Top assignee: Owens-Illinois Glass Container Inc.. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Robert D Heetfield. Retrieved from https://idiyas.com/inventor/robert-d-heetfield

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: The Innovations of Robert D. Heetfield

Introduction

Robert D. Heetfield is an accomplished inventor based in Sylvania, Ohio. He is known for his innovative contributions to the field of materials science, particularly in the development of specialized alloys. His work has significant implications for various industrial applications.

Latest Patents

Heetfield holds a patent for a Nickel base alloy glass shaping member. This alloy has a specific composition that includes Chromium (13-15%), Silicon (3.4-4.2%), Boron (1.7-2.3%), and the balance being Nickel. The alloy is cast in a mold made by the lost wax process from CaCO3. The casting process involves heating the mold to 2300°F, holding it in a furnace at 1750°F for an hour, and then rapidly cooling it to room temperature. The resulting casting has a low hardness of R.c 30±3, allowing for machining. After machining, the casting is heated to 1150°F for at least three hours before cooling, which hardens it to R.c 45 to R.c 50.

Career Highlights

Heetfield is associated with Owens-Illinois Glass Container Inc., where he applies his expertise in materials to enhance product performance. His innovative approach has contributed to advancements in glass container manufacturing.

Conclusion

Robert D. Heetfield's work exemplifies the intersection of innovation and practical application in materials science. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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