Robert Clark

Title: Innovations by Robert Clark in Thermal Etching

Introduction

Robert Clark is an accomplished inventor based in Leuven, Belgium. He has made significant contributions to the field of thermal etching, particularly with his innovative methods for etching ruthenium metal layers. His work is essential for advancements in various technological applications.

Latest Patents

Robert Clark holds a patent for the thermal etching of ruthenium. The patent describes methods for thermal dry etching of a ruthenium (Ru) metal layer. In the disclosed embodiments, a substrate containing a Ru metal layer is exposed to a gas pulse sequence while held at a relatively high substrate temperature, specifically greater than or equal to about 160° C. This process allows for effective thermal etching of the Ru metal layer. The gas pulse sequence includes multiple gas pulses supplied sequentially with minimal overlap. These gas pulses create volatile reaction products that vaporize from the Ru surface and non-volatile oxide surface layers that are subsequently removed, resulting in atomic layer etching (ALE) of the Ru metal layer.

Career Highlights

Robert Clark is currently associated with Tokyo Electron Limited, a leading company in the semiconductor industry. His expertise in thermal etching has positioned him as a valuable asset in the field of materials science and engineering.

Collaborations

Throughout his career, Robert has collaborated with notable colleagues, including Hisashi Higuchi and Kai-Hung Yu. These collaborations have further enhanced the impact of his work in the industry.

Conclusion

Robert Clark's innovative approaches to thermal etching of ruthenium have paved the way for advancements in semiconductor technology. His contributions are vital for the ongoing development of efficient etching methods in the industry.