Littleton, CO, United States of America

Robert C Amme

This inventor holds 2 USPTO granted patents. Top assignee: Colorado Seminary. Active years: 1997-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Robert C Amme. Retrieved from https://idiyas.com/inventor/robert-c-amme

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1997-1999

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2 patents (USPTO):Explore Patents

Title: Innovations of Robert C Amme

Introduction

Robert C Amme is a notable inventor based in Littleton, Colorado. He has made significant contributions to the field of semiconductor processing, holding two patents that showcase his innovative approach to technology.

Latest Patents

Amme's latest patents include the "Photon-enhanced neutral beam etcher and cleaner" and "Processing substrates with a photon-enhanced neutral beam." Both patents describe an apparatus for processing substrates that incorporates a plurality of molecular dissociation furnaces. Each furnace produces a directed beam of neutral dissociated reactive species aimed at the surface of a semiconductor substrate. Additionally, a photon source is directed at the substrate's surface, with its intensity and wavelength selected to enhance the reaction rate beyond that of the reactive beam acting alone.

Career Highlights

Robert C Amme is associated with Colorado Seminary, where he applies his expertise in semiconductor technology. His work has contributed to advancements in the efficiency and effectiveness of substrate processing.

Collaborations

Amme collaborates with Bert Van Zyl, further enhancing the innovative efforts within his field.

Conclusion

Robert C Amme's contributions to semiconductor processing through his patents reflect his commitment to innovation and technology advancement. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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