Robert Birkner

Title: The Innovative Contributions of Robert Birkner

Introduction

Robert Birkner is a notable inventor based in Jena, Germany. He has made significant contributions to the field of microlithography, particularly through his innovative patent. His work is recognized for its impact on the efficiency and effectiveness of lithography processes.

Latest Patents

Robert Birkner holds a patent for a "Method and device for characterizing a mask for microlithography." This invention relates to a method and device that characterizes a mask intended for use in a lithography process within a microlithographic projection exposure apparatus. The method involves illuminating structures of the mask using an illumination optical unit, followed by imaging the mask onto a detector unit through an imaging optical unit. The recorded image data is then evaluated in an evaluation unit. The imaging process is conducted in multiple individual imagings, which vary based on the illumination settings or polarization effects, emulating the predefined settings for the lithography process.

Career Highlights

Robert Birkner is associated with Carl Zeiss SMT GmbH, a company renowned for its advancements in optical systems and lithography technology. His role at the company has allowed him to contribute to cutting-edge innovations in the field.

Collaborations

Throughout his career, Robert has collaborated with esteemed colleagues such as Holger Seitz and Ute Buttgereit. These collaborations have further enhanced the development and application of his inventions.

Conclusion

Robert Birkner's contributions to microlithography through his innovative patent demonstrate his expertise and commitment to advancing technology in this field. His work continues to influence the industry and pave the way for future innovations.