This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1985.
Company Filing History:
Years Active: 1985
Title: The Innovations of Robert B. McClure
Introduction
Robert B. McClure is a notable inventor based in Essex Junction, VT (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to plasma etching.
Latest Patents
Robert B. McClure holds a patent for RF Coupling techniques. This invention involves an improved reactive ion plasma etching apparatus that features an enhanced electrode designed to hold products, such as semiconductor wafers, during the etching process. The apparatus is equipped with multiple apertures that allow for the insertion of tailored product holders. This design alters the plasma over each holder, ensuring more uniform etching of the product, regardless of its position on the electrode. He has 1 patent to his name.
Career Highlights
McClure is associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to be at the forefront of technological advancements in the semiconductor industry. His innovative approaches have contributed to the efficiency and effectiveness of plasma etching processes.
Collaborations
Throughout his career, Robert B. McClure has collaborated with notable colleagues, including George F. Cunningham, Jr. and Daniel J. Poindexter. These collaborations have fostered an environment of innovation and have led to advancements in their respective fields.
Conclusion
Robert B. McClure's contributions to the field of semiconductor technology through his patent for RF Coupling techniques exemplify the impact of innovation in modern technology. His work continues to influence the industry and pave the way for future advancements.