Company Filing History:
Years Active: 1976-1985
Title: The Innovative Contributions of Robert B Heiart
Introduction
Robert B Heiart is a notable inventor based in Middletown, NJ (US), recognized for his significant contributions to the field of photolithography. With a total of 9 patents to his name, he has made strides in the development of processes and apparatuses that enhance the efficiency and effectiveness of substrate registration and exposure.
Latest Patents
Among his latest patents, one notable invention is the process for registering and exposing sheet substrates using a photosensitive liquid. This innovative method involves applying a photosensitive liquid between the substrate and the photomask during contact printing, allowing for precise alignment in a hinged relationship. Another significant patent is the apparatus for automatic repetitive registration and imagewise exposure of sheet substrates. This device employs liquid applicator means to facilitate contact between a photomask and a photosensitive layer on the substrate through a liquid medium.
Career Highlights
Robert B Heiart is currently employed at E.I. du Pont de Nemours and Company, where he continues to push the boundaries of innovation in his field. His work has not only contributed to the advancement of technology but has also positioned him as a key figure in the industry.
Collaborations
Throughout his career, Robert has collaborated with esteemed colleagues, including Abraham B Cohen and Magalie M Charles. These partnerships have fostered an environment of creativity and innovation, leading to the development of groundbreaking technologies.
Conclusion
In summary, Robert B Heiart's contributions to the field of photolithography through his patents and collaborations highlight his role as a significant inventor. His work continues to influence the industry and pave the way for future innovations.